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Wet transfer process for MEMS freestanding PMMA/graphene membrane development
Norliana Yusof1, Badariah Bais2, Burhanuddin Yeop Majlis3, Norliana Yusof4, Badariah Bais5, Norhayati Soin6.
Process of transferring poly (methyl methacrylate) (PMMA)/Graphene layer to form a
freestanding membrane requires a proper method to ensure that the membrane is well
suspended with high graphene coverage. This paper demonstrates a method for transferring
PMMA/Graphene onto an etched silicon cavity, which forms freely suspended graphene
using ferric chloride (FeCl3) solution. The characterisation was performed with an optical
microscope and Raman spectroscopy to examine the quality of the transferred
PMMA/Graphene membrane. Wet transfer process by FeCl3 etchant was successfully applied
to develop a freestanding PMMA/Graphene membrane on a silicon etch cavity. From the
study, 0.5M concentration of FeCl3 etchant is more suitable to be applied compared to 1.0 M
in order to form a freestanding PMMA / Graphene membrane
Affiliation:
- Universiti Kebangsaan Malaysia (UKM), Malaysia
- Universiti Kebangsaan Malaysia (UKM), Malaysia
- Universiti Kebangsaan Malaysia (UKM), Malaysia
- Universiti Sultan Zainal Abidin, Terengganu (Malaysia), Malaysia
- Universiti Kebangsaan Malaysia, Malaysia
- University of Malaya, Malaysia
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Indexation |
Indexed by |
MyJurnal (2021) |
H-Index
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2 |
Immediacy Index
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0.000 |
Rank |
0 |
Indexed by |
Scopus 2020 |
Impact Factor
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CiteScore (1.3) |
Rank |
Q3 (Electrical and Electronic Engineering)) Q4 (Electronic, Optical and Magnetic Materials) |
Additional Information |
SJR (0.298) |
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