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Dielectric effects on graphene field effect transistors studied with an iterative simulation approach
Sriyanka Behera1, Gananath Dash2, Satya Ranjan Pattanaik3.
A simulation method has been formulated to study the characteristics of a Graphene Field
Effect Transistor (GFET). The method takes care of the effect of source and drain contact
resistances while iteratively solving for the drain current. The results when compared with
experimental data validate our modeling and simulation approach. The method has been
used to investigate the effect of different gate dielectric materials and their dimensions on
the output as well as transfer characteristics of the GFET. Our results open new ways for the
possibility of dielectric engineered GFET characteristics suiting to the requirement of a given
device application. The convergence of the point of inflexion for dual positive gated GFETs is
interesting. The existence of a critical thickness for each dielectric material, beyond which
the current saturates and the rise in its value with dielectric constant(εr), are some novel
features worth attention.
Affiliation:
- Sambalpur University, India
- Sambalpur University, India
- Institute Park, Palur Hills, Berhampur, India
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Indexation |
Indexed by |
MyJurnal (2021) |
H-Index
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2 |
Immediacy Index
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0.000 |
Rank |
0 |
Indexed by |
Scopus 2020 |
Impact Factor
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CiteScore (1.3) |
Rank |
Q3 (Electrical and Electronic Engineering)) Q4 (Electronic, Optical and Magnetic Materials) |
Additional Information |
SJR (0.298) |
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