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Impact of dielectric engineering on Analog/RF and linearity performance of double gate tunnel FET
Guenifi Naima1, Shiromani Balmukund Rahi2, G. Boussahla3.
Tunnel FET is one of the alternative devices for low power electronics, having steep
subthreshold swing and lower leakage current than conventional MOSFET. In this
research, we have implemented the idea of high -k gate dielectric on double gate Tunnel
FET, DG-TFET for improvement of device features. An extensive investigation for the
analog/RF and linearity feature of DG-TFET has been done here for low power circuit and
system development. Several essential analog/RF and linearity parameters like
transconductance(gm), transconductance generation factor (gm/IDS), its high-order
derivatives (gm2, gm3), cut-off frequency (fT), gain band width product (GBW) and
transconductance generation factor (gm/IDS) have been investigated for low power RF
applications. The VIP2, VIP3, IMD3, IIP3, distortion characteristics (HD2, HD3), 1- dB the
compression point, delay and power delay product performance have also been
thoroughly studied. It has been observed that the device features discussed for circuitry
applications are found to be sensitive to of gate materials, design configuration and input
signals.
Affiliation:
- University MostefaBenboulaid of Batna, Algeria
- Narendra Dev University of Agriculture and Technology,, India
- University MostefaBenboulaid of Batna, Algeria
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Indexation |
Indexed by |
MyJurnal (2021) |
H-Index
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2 |
Immediacy Index
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0.000 |
Rank |
0 |
Indexed by |
Scopus 2020 |
Impact Factor
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CiteScore (1.3) |
Rank |
Q3 (Electrical and Electronic Engineering)) Q4 (Electronic, Optical and Magnetic Materials) |
Additional Information |
SJR (0.298) |
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