In this paper, we outline the successful preparation of a nanostructured Nb2O5 thin film by utilizing Q-switched Nd:YAG pulsed laser in a vacuum environment. The deposition was performed with the fundamental wavelength, 350 ºC as substrate temperature and laser energy of 657 mJ. The film optical, structural, topographical, and morphological properties were investigated by the UV-Visible spectrophotometer, photoluminescence, XRD analyses, AFM, and FE-SEM. The elemental compositions were also tested by EDX analyses. The estimated indirect band gap value (confirmed by PL) agreed with many reported works and studies. It was also well suited for various applications. The data extracted from XRD profile provided well-defined Polycrystalline peaks with the orthorhombic phase (T-Nb2O5) as the predominant plane. Monoclinic (H-Nb2O5), commonly formed at very high route temperatures, was interestingly formed by PLD technique at a substrate temperature of only 350 ºC. The obtained structures were characterized without any post-annealing treatment.