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Effects of target density on structure and properties of sputtered indium tin oxide films
Munir, Badrul1, Jung, Younghee2, Wibowo, Rachmat A3, Kimi, Kyooho4.
Indium Tin Oxide (ITO) thin films were deposited from various target densities
(98.7%~99.6%) using RF magnetron sputtering. Effect of the sputtering target densities on
the structural, electrical and optical properties of deposited ITO thin films was investigated.
The preferable (400) crystalline orientation peak was observed on the films deposited from
> 99.0% target density. Higher target density produced films with higher roughness but
lower resistivity. All of the deposited films showed optical transmittance more than 85% in
the visible wavelength region. It is necessary to use the highest target density for sputtering
deposition of ITO thin films.
Affiliation:
- Universitas Indonesia, Indonesia
- Nanyang Technological University, Singapore
- Yeungnam University, Korea, South
- Yeungnam University, Korea, South
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| Indexation |
| Indexed by |
MyJurnal (2021) |
| H-Index
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2 |
| Immediacy Index
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0.000 |
| Rank |
0 |
| Indexed by |
Scopus 2020 |
| Impact Factor
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CiteScore (1.3) |
| Rank |
Q3 (Electrical and Electronic Engineering))
Q4 (Electronic, Optical and Magnetic Materials) |
| Additional Information |
SJR (0.298) |
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